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eBook Nano Lithography epub

by Stefan Landis

eBook Nano Lithography epub
  • ISBN: 1848212119
  • Author: Stefan Landis
  • Genre: Engineering
  • Subcategory: Engineering
  • Language: English
  • Publisher: Wiley-ISTE; 1 edition (February 21, 2011)
  • Pages: 320 pages
  • ePUB size: 1702 kb
  • FB2 size 1637 kb
  • Formats lrf mobi mbr docx


Microlithography, Nanolithography, Nanotechnology.

Nano-Lithography

Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. Download from free file storage.

The rights of Stefan Landis to be identified as the author of this work have been asserted by him in. .

p. cm. Includes bibliographical references and index. ISBN 978-1-84821-211-4 1. Microlithography.

Nanolithography is etching, writing or printing on a material surface

Nanolithography is etching, writing or printing on a material surface. Lithographic techniques include Photolithography, Electron beam lithography, X-ray lithography, Extreme UV lithography, Light coupling nanolithography, Scanning probe microscope lithography, Nanoimprint lithography, Dip-Pen nanol.

Nano Lithography – Stefan Landis. This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography.

This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques .

This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. The presence of a residual layer at the end of a classical NanoImprint Lithography (NIL) process is at the root of many issues when NIL is used to manufacture resist patterns used later as an etching mask.

The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations.

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Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields.

Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS).This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography.

It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.

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